스퍼터링 타겟 참조 to a 스퍼터링 소스 that is 스퍼터링 및 증착 on a substrate under appropriate process conditions by magnetron sputtering, multi-arc ion plating or other types of coating equipment to form various functional films. according to the composition, targets can be divided into pure metal targets, alloy targets, oxide targets, silicide targets, etc. ; according to the shape, they can be divided into planar targets (rectangular targets and arc targets) and tubular targets. . Sputtering targets are widely used in many fields such as decoration, tools and molds, glass, electronic devices, semiconductors, magnetic recording, flat displays, solar cells, etc. Different fields require different target materials.
1. 장식 코팅
장식 코팅 주로 참조 to the surface coating of mobile phones, watches, 안경, sanitary ware, hardware parts and other products. it not only plays a role in beautifying the color, but also has wear resistance, corrosion resistance and other functions. The main varieties of targets for decorative coating include: chromium target, titanium target, zirconium target, nickel target, tungsten target, 티타늄 알루미늄 target, stainless steel target, etc.
2. Coating of Processing molds or tools
그것은 주로 주로 사용 대상 표면 강화 의 도구 및 금형, which can significantly improve the service life of tools and molds and the quality of processed parts. In recent years, driven by the development of the aerospace and automotive industries, the technical level and production efficiency of the global manufacturing industry have made great progress, and the demand for high-performance cutting tools and molds is increasing day 일로. 그만큼 메인 유형 의 목표 사용 용 용 금형 코팅 포함: 티타늄-알루미늄 목표, 크롬 대상, 티타늄 목표, 등.
3. Glass coating
application of target materials on glass is mainly to produce low-radiation coated glass, which uses the principle of magnetron sputtering to sputter multiple layers of thin films on glass to achieve the functions of energy saving, light control and decoration. The main types of targets include: silver target, chromium target, titanium target, nickel-chromium target, silicon-aluminum target, titanium oxide target, silicon-aluminum target, titanium oxide target, etc. 다른 중요한 응용 의 대상 재료 켜짐 유리 is 준비 의 자동차 백미러 거울, 주로 크롬 목표, 알루미늄 표적, 티타늄 산화물 표적, 등. As the 등급 requirements for 자동차 백미러 계속 to 증가, 많은 회사 have switched from the original aluminum plating process to the vacuum sputtering chrome plating process.
4. 전자 장치 코팅
전자 장치 코팅 주로 사용 용 박막 필름 저항기 및 박막 필름 커패시터. 타겟 재료 용 박막 필름 저항기 포함 NiCr 타겟, 니켈 크롬 실리콘 (NiCrSi) 타겟, 크롬 실리콘 (CrSi) 타겟, 탄탈륨 (Ta) 타겟, 니켈 크롬 알루미늄 (NiCrA1) 타겟, 등.
5. 평면 디스플레이 코팅
급속 성장 인 수요 for flat panel display devices from portable personal computers, televisions, mobile phones, etc. has greatly promoted the development of various types of flat panel display devices. Its types include: liquid crystal display device (LCD), plasma display device (PDP), etc. All these flat panel display devices use various types of films. Without thin film technology, there would be no flat panel display 장치. In Order to ensure the 균일성 of 대면적 코팅, 향상 생산성 및 감소 비용, 스퍼터링 기술 is increasingly used to prepare these coatings. The main types of targets used for flat display coating include: chromium targets, molybdenum targets, aluminum alloy targets, copper targets, etc.
6. 반도체 코팅
신속 개발 의 정보 기술 필요 통합 회로 to be more and more integrated. Each unit device is composed of a substrate, an insulating layer, a dielectric layer, a conductor layer and a protective layer. Among them, the dielectric layer, the conductor layer and even the protective layer The sputtering coating process is used, so the sputtering target is one of the core materials for preparing 통합 회로. 타겟 재료 반도체 코팅 요구 높음 목표 순도 % 2c 일반적으로 위 4N 또는 5N. 메인 품종 포함 텅스텐 티타늄 % 2c 티타늄 타겟 % 2c 알루미늄 타겟 및 구리 타겟.
